Analysis of X-ray photoelectron spectra of silicon-based polymers by deMon density-functional calculations using model molecules

Polymer Journal

Volumn 30, Issue 2, 1998, Pages 142-148

  Kuroki, Shigeki ^a,e   Endo, Kazunaka ^b   Maeda, Shigehiro ^c   Chong, Delano P ^d   Duffy, Patrick ^d  

^a Japan High Polymer Center   (Japan)

^b KANAZAWA UNIVERSITY   (Japan)

^c University of Tokyo   (Japan)

^d UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^e TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Density Functional Calculation; Electronic State; Fermi Level; Silicon Based Polymer; X Ray Photoelectron Spectra

Indexed keywords

CALCULATIONS; ELECTRONIC DENSITY OF STATES; FERMI LEVEL; FUNCTIONS; IONIZATION; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CORE ELECTRON BINDING ENERGIES; DEMON DENSITY FUNCTIONAL CALCULATIONS; RESTRICTED DIFFUSE IONIZATION MODEL; UNRESTRICTED GENERALIZED STATE MODEL;

POLYSILANES;

EID: 0031651476     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.30.142     Document Type: Article

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