Non-catalytic displacement plating (NCDP) of photosensitive semiconducting thin films

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 139-146

  Kumar, Mukul ^a   Sharan, M K ^a   Sharon, Maheshwar ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

Chalcogenides; Electroless; Semiconductors; Thin films

Indexed keywords

DEPOSITION; ENERGY GAP; LIGHT SENSITIVE MATERIALS; SUBSTRATES; TERNARY SYSTEMS; THIN FILMS;

NON CATALYTIC DISPLACEMENT PLATING (NCDP);

SEMICONDUCTING FILMS;

EID: 0031651452     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00734-7     Document Type: Article

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