Characterization of r.f.-sputtered iron oxide films for modeling passive films

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 46-60

  Stenberg, T ^a   Vuoristo, P ^a   Keranen J ^a   Mantyla T ^a   Buchler M ^b   Virtanen, S ^b   Schmuki, P ^b   Bohni H ^b  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

^b ETH ZURICH   (Switzerland)

Author keywords

Artificial passive films; Iron oxides; R.f. Sputtering; Transmission electron microscopy (TEM)

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL ORIENTATION; ELECTROCHEMISTRY; FERROELECTRIC MATERIALS; IRON OXIDES; PASSIVATION; PHOTOCHEMICAL REACTIONS; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

X RAY ABSORPTION NEAR EDGE SPECTROSCOPY (XANES);

MAGNETIC FILMS;

EID: 0031651329     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00336-2     Document Type: Article

References (33)

1. U. Schwertmann, R.M. Cornell, Iron Oxides in Laboratory, Preparation and Characterization, VCH Weinham, 1991, p. 5.
2. D.W. Richerson, Modern Ceramic Engineering, Properties, Processing and Use in Design, 2nd edn., Marcel Dekker, 1992, p. 235.
3. W.A. Deer, R.A. Howie, J. Zissman, An Introduction to Rock-Forming Minerals, 2nd edn., Longman Scientific and Technical, 1992, p. 540.
4. S. Ohta, A. Terada, Thin Solid Films 143 (1986) 73.
5. K. Siroky, J. Jiresova, L. Hudec, Thin Solid Films 245 (1994) 211.
6. O. Ishii, J. Appl. Phys. 63 (9) (1988) 4753.
7. G.-L. Chen, J.M. Sivertsen, J.H. Hujy, IEEE Trans. Magn. 20 (5) (1984) 827.
8. W.D. Chang, T.S. Chin, H.S. Wu, J.H. Jou, J. Appl. Phys. 77 (3) (1995) 1184.
9. J.K. Howard, J. Vac. Sci. Technol. A 4 (1) (1986) 1.
10. Y. Ishii, A. Terada, O. Ishii, S. Ohta, S. Hattori, K. Makino, IEEE Trans. Magn. 16 (1980) 1114.
11. M. Chen, C. Ortiz, G. Lim, R. Sigsbeet, G. Castillo, IEEE Trans. Magn. 23 (1987) 3423.
12. S. Hattori, Y. Ishii, M. Shinohara, T. Nakagawa, IEEE Trans. Magn. 15 (1979) 1549.
13. J.K. Lin, J.M. Sivertsen, J.H. Judy, J. Magn. Magn. Mater. 54-57 (1986) 1659.
14. J. Heller, IEEE Trans. Magn. 12 (1976) 396.
15. K. Sugimoto, M. Seto, S. Tanaka, N. Hara, Oxide Films on Metals and Alloys, The Electrochem. Soc., 1992, 530.
16. S. Virtanen, P. Schmuki, H. Böhni, P. Vuoristo, T. Mäntylä, J. Electrochem. Soc. 142 (1995) 3067.
17. P. Schmuki, S. Virtanen, A.J. Davenport, C.M. Vitus, J. Electrochem. Soc. 143 (1996) 574.
18. A.J. Davenport, M. Samsone, J. Electrochem. Soc. 142 (1995) 725.
19. J.L. Vossen, W. Kern (Eds.), Thin Film Processes, Academic Press, New York (1978), p. 14.
20. K.L. Chopra (Ed.), Thin Film Phenomena, McGraw-Hill, New York (1969), p. 23.
21. L.I. Maissel, R. Glang (Eds.), Handbook of Thin Film Technology, McGraw-Hill, New York (1970), 3-2.
22. M. Naoe, Y. Hoshi, S. Yamanaka, J. Appl. Phys. 53 (1992) 2748.
23. G.W. Van Oosterhout, C.J.M. Rooijmans, Nature 181 (1958) 44.
24. P. Hirsch, A. Howie, R. Nicholson, D.W. Pashley, M.J. Whelan, Electron Microscopy of Thin Crystals, 2nd edn., Krieger Publishing, Malabar, FL, 1977, p. 132.
25. C. Colliex, T. Manoubi, C. Ortiz, Phys. Rev. B 44 (1991) 11402.
26. L.A. Grunes, R.D. Leapman, C.N. Wilker, R. Hoffmann, A.B. Kunz, Phys. Rev. B 25 (1982) 7157.
27. F.M.F. deGroot, M. Grioni, J.C. Fuggle, J. Ghijsen, G.A. Sawatzky, H. Pettersen, Phys. Rev. B 40 (1989) 5715.
28. L.A.J. Garvie, A.J. Graven, R. Brydson, Am. Miner. 79 (1994) 411.
29. K.M. Krishan, Ultramicroscopy 32 (1990) 309.
30. S. Virtanen, P. Schmuki, H. Böhni, P. Vuoristo, T. Mäntylä, Proc. Oxide Films on Metals and Alloys, Vol. 94-25 , in: K.R. Hebert, G.E. Thompson (Eds.), The Electrochemical Soc., Pennington, NJ, 1994, p. 129.
31. G.H. Jonker, S.V. Houten, Halbleiterprobleme 6 (1961) 118.
32. P. Schmuki, M. Büchler, S. Virtanen, H. Böhni, J. Electrochem. Soc. 142 (1995) 3336.
33. J. Schefold, J. Electroanal. Chem. 362 (1993) 97.