Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1998, Pages 556-561

  Sato, K ^a   Shikida, M ^a   Yamashiro, T ^a   Asaumi, K ^a   Iriye, Y ^a   Yamamoto, M ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHEMICAL BONDS; CRYSTAL ORIENTATION; ETCHING; SINGLE CRYSTALS;

ANISOTROPIC ETCHING; TETRAMETHYL AMMONIUM HYDROXIDE;

SILICON WAFERS;

EID: 0031651048     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)