Effect of Xe+ bombardment on the formation of highly oriented rutile-type titanium oxide films

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 1-3

  Zhang, Feng ^a   Zheng, Zhihong ^a   Chen, Yu ^a   Mao, Yingjun ^a   Liu, Xianghuai ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Ion bombardment; Sputtering; Titanium oxide; X ray diffraction

Indexed keywords

CRYSTAL ORIENTATION; FILM GROWTH; FILM PREPARATION; ION BOMBARDMENT; SUBSTRATES; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; X RAY CRYSTALLOGRAPHY; XENON;

ION BEAM ENHANCED DEPOSITION (IBED); TITANIUM OXIDE FILMS;

TITANIUM DIOXIDE;

EID: 0031650846     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00168-5     Document Type: Letter

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