-
1
-
-
0028513302
-
-
K. Arita, E. Fujii, Y. Shimada, Y. Uemoto, T. Nasu, A. Inoue, A. Matsuda, T. Otsuki, and N. Suzuoka, Jpn. J. Appl. Phys. 33, 5397-5399 (1994).
-
(1994)
Jpn. J. Appl. Phys.
, vol.33
, pp. 5397-5399
-
-
Arita, K.1
Fujii, E.2
Shimada, Y.3
Uemoto, Y.4
Nasu, T.5
Inoue, A.6
Matsuda, A.7
Otsuki, T.8
Suzuoka, N.9
-
2
-
-
0005927189
-
-
V. Chivukula, J. Ilowski, I. Emesh, D. McDonald, and P. Leung, Integrated Ferroelectrics 10, 247-255 (1995).
-
(1995)
Integrated Ferroelectrics
, vol.10
, pp. 247-255
-
-
Chivukula, V.1
Ilowski, J.2
Emesh, I.3
McDonald, D.4
Leung, P.5
-
3
-
-
36449005349
-
-
W. Y. Hsu, J. D. Luttmer, R. Tsu, S. Summerfeit, M. Bedekar, T. Tokumoto, and J. Nulman, Appl. Phys. Lett. 66, 2975-2977 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 2975-2977
-
-
Hsu, W.Y.1
Luttmer, J.D.2
Tsu, R.3
Summerfeit, S.4
Bedekar, M.5
Tokumoto, T.6
Nulman, J.7
-
4
-
-
0029369259
-
-
T. Kawahara, M. Yamamuka, A. Yuuki, and K. Ono, Jpn. J. Appl. Phys. 34, 5077-5082 (1995).
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 5077-5082
-
-
Kawahara, T.1
Yamamuka, M.2
Yuuki, A.3
Ono, K.4
-
5
-
-
0029371576
-
-
K. Takemura, S. Yamamichi, P-Y. Lesaicherre, K. Tokashiki, H. Miyamoto, H. Ono, Y. Miyasaka, and M. Yoshida, Jpn. J. Appl. Phys. 34, 5224-5229 (1995).
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 5224-5229
-
-
Takemura, K.1
Yamamichi, S.2
Lesaicherre, P.-Y.3
Tokashiki, K.4
Miyamoto, H.5
Ono, H.6
Miyasaka, Y.7
Yoshida, M.8
-
6
-
-
36449005405
-
-
Q. X. Jia, X. D. Wu, S. R. Foltyn, and P. Tiwari, Appl. Phys. Lett. 66, 2197-2199 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 2197-2199
-
-
Jia, Q.X.1
Wu, X.D.2
Foltyn, S.R.3
Tiwari, P.4
-
7
-
-
0029368986
-
-
K. Numata, Y. Fukuda, K. Aoki, and A. Nishimura, Jpn. J. Appl. Phys. 34, 5245-5249 (1995).
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 5245-5249
-
-
Numata, K.1
Fukuda, Y.2
Aoki, K.3
Nishimura, A.4
-
8
-
-
0029370272
-
-
C. S. Hwang, S. O. Park, C. S. Kang, H-J. Cho, H-K. Kang, S. T. Ahn, and M. Y. Lee, Jpn. J. Appl. Phys. 34, 5178-5183 (1995).
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 5178-5183
-
-
Hwang, C.S.1
Park, S.O.2
Kang, C.S.3
Cho, H.-J.4
Kang, H.-K.5
Ahn, S.T.6
Lee, M.Y.7
-
9
-
-
0029371453
-
-
T. Nakamura, Y. Yamanaka, A. Morimoto, and T. Shimizu, Jpn. J. Appl. Phys. 34, 5150-5153 (1995).
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 5150-5153
-
-
Nakamura, T.1
Yamanaka, Y.2
Morimoto, A.3
Shimizu, T.4
-
15
-
-
84955015130
-
-
I. Kondo, T. Yoneyama, O. Takenaka, and A. Kinbara, J. Vac. Sci. Technol. A 10, 3456-3459 (1992).
-
(1992)
J. Vac. Sci. Technol. A
, vol.10
, pp. 3456-3459
-
-
Kondo, I.1
Yoneyama, T.2
Takenaka, O.3
Kinbara, A.4
-
16
-
-
36449002472
-
-
K. Sreenivas, I. Reaney, T. Maeder, N. Setter, C. Jagadish, and R. G. Elliman, J. Appl. Phys. 75, 232-239 (1994).
-
(1994)
J. Appl. Phys.
, vol.75
, pp. 232-239
-
-
Sreenivas, K.1
Reaney, I.2
Maeder, T.3
Setter, N.4
Jagadish, C.5
Elliman, R.G.6
-
17
-
-
3643060236
-
-
J. Olowolafe, R. E. Jones, Jr., A. C. Campbell, R. I. Hegde, C. J. Mogab, and R. B. Gregory, J. Appl. Phys. 73, 1764-1772 (1993).
-
(1993)
J. Appl. Phys.
, vol.73
, pp. 1764-1772
-
-
Olowolafe, J.1
Jones Jr., R.E.2
Campbell, A.C.3
Hegde, R.I.4
Mogab, C.J.5
Gregory, R.B.6
-
18
-
-
0000993680
-
-
G. R. Fox, S. Trolier-McKinstry, S. B. Krupanidhi, and L. M. Casas, J. Mater. Res. 10, 1508-1515 (1995).
-
(1995)
J. Mater. Res.
, vol.10
, pp. 1508-1515
-
-
Fox, G.R.1
Trolier-McKinstry, S.2
Krupanidhi, S.B.3
Casas, L.M.4
-
20
-
-
0029234779
-
-
Ferroelectric Thin Films IV, edited by B. A. Tuttle, S. B. Desu, R. Ramesh, and T. Shiosaki Pittsburgh, PA
-
R. Tsu, H-Y. Liu, W-Y. Hsu, S. Summerfelt, K. Aoki, and B. Gnade, in Ferroelectric Thin Films IV, edited by B. A. Tuttle, S. B. Desu, R. Ramesh, and T. Shiosaki (Mater. Res. Soc. Symp. Proc. 361, Pittsburgh, PA, 1995), pp. 275-280.
-
(1995)
Mater. Res. Soc. Symp. Proc.
, vol.361
, pp. 275-280
-
-
Tsu, R.1
Liu, H.-Y.2
Hsu, W.-Y.3
Summerfelt, S.4
Aoki, K.5
Gnade, B.6
|