Silicon carbide membranes modified by chemical vapor deposition using species of low sticking coefficients in a silane/acetylene reaction system

Journal of the American Ceramic Society

Volumn 81, Issue 1, 1998, Pages 159-165

  Lee, Lang Luen ^a   Tsai, Dah Shyang ^a,b  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; MECHANICAL PERMEABILITY; PHYSICAL PROPERTIES; POROUS MATERIALS; REACTION KINETICS; SILANES; SILICON CARBIDE;

GAS PHASE REACTION; LOW STICKING COEFFICIENT; PORE SIZE; PORE STRUCTURE; SELECTIVITY; SILANE ACETYLENE REACTION SYSTEM; SILICON CARBIDE MEMBRANE;

MEMBRANES;

EID: 0031649958     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02308.x     Document Type: Article

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