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Volumn 183, Issue 1-2, 1998, Pages 217-226

Autostoichiometric vapor deposition III. A study of stoichiometry and characterization of epitaxial LiTaO3 layer

(10) Chour, K W a Zhang, R C a Goorsky, M S b Takada, T c Akiba, E c Kumagai, T c Kawaguchi, K c Jensen, M L a Eaves, C a Xu, R a

a UNIVERSITY OF UTAH (United States)

b UNIVERSITY OF CALIFORNIA (United States)

c NATL INST OF MAT AND CHEM RES (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; LATTICE CONSTANTS; OPTICAL FILMS; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; STOICHIOMETRY; VAPOR DEPOSITION; X RAY CRYSTALLOGRAPHY;

LITHIUM TANTALATE; SUBLIMATE COMPOSITION ANALYSIS;

LITHIUM COMPOUNDS;

EID: 0031649092 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(97)00385-0 Document Type: Article

Times cited : (5)

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