Surface and interface roughness of ultrathin nitric oxide oxynitride gate dielectric

Journal of the Electrochemical Society

Volumn 145, Issue 1, 1998, Pages

  Hegde, Rama I ^a   Maiti, Bikas ^a   Rai, Raghaw S ^a   Reid, Kimberly G ^a   Tobin, Philip J ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; INTERFACES (MATERIALS); OXIDES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

POWER SPECTRAL DENSITY; THERMAL OXIDE; ULTRATHIN NITRIC OXIDE OXYNITRIDE;

DIELECTRIC FILMS;

EID: 0031648590     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838200     Document Type: Article

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