Endothermic reactions between mullite and silicon carbide in an argon plasma environment

Journal of the American Ceramic Society

Volumn 81, Issue 1, 1998, Pages 233-236

  Park, Youngsoo ^a,b,c   McNallan, Michael J ^a,c   Butt, Darryl P ^b,c  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CEMENTS; CHEMICAL REACTIONS; DEFORMATION; ENERGY ABSORPTION; OXIDE MINERALS; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SINTERING; SPECTROSCOPY; SURFACE STRUCTURE;

ENDOTHERMIC REACTIONS; MULLITE; PLASMA SINTERING;

CERAMIC MATRIX COMPOSITES;

EID: 0031647490     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02322.x     Document Type: Article

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