Effect of the surface treatment on the room-temperature bonding of Al to Si and SiO2

Journal of Materials Science

Volumn 33, Issue 1, 1998, Pages 253-258

  Hosoda, N ^a   Kyogoku, Y ^a   Suga, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC BEAMS; BOND STRENGTH (MATERIALS); FREE RADICALS; FUSED SILICA; SILICON; SURFACE TREATMENT;

FAST ATOM BEAMS; FREE RADICAL BEAMS; SURFACE ACTIVATION;

BONDING;

EID: 0031647165     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004390923252     Document Type: Article

References (11)

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