Ferroelectric SrBi2Ta2O9 thin films deposited on Si(100) by pulsed laser deposition

Physica Status Solidi (A) Applied Research

Volumn 165, Issue 1, 1998, Pages 213-217

  Desu, S B ^a   Cho, H S ^a   Nagata, M ^b  

^a State University   (United States)

^b SHARP CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DEPOSITION; ELECTRIC FIELD EFFECTS; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; PERMITTIVITY; PULSED LASER APPLICATIONS; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

FERROELECTRIC THIN FILMS; PULSED LASER DEPOSITION (PLD);

DIELECTRIC FILMS;

EID: 0031646971     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199801)165:1<213::AID-PSSA213>3.0.CO;2-H     Document Type: Article

References (10)

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