New developments in the field of MF-sputtering with dual magnetron to obtain higher productivity for large area coatings

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1998, Pages 187-192

  Heister, U ^a   Krempel Hesse, J ^a   Szczyrbowski, J ^a   Braeuer, G ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC FIELDS; MAGNETRON SPUTTERING; SILICA; SILICON NITRIDE; SPUTTER DEPOSITION; TITANIUM DIOXIDE;

DUAL MAGNETRON CATHODE;

ANTIREFLECTION COATINGS;

EID: 0031645541     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)