Application of high purity ozone beam in the formation and characterization of SiO2 and other oxide thin films

Proceedings of the International Conference on Electric Charge in Solid Insulators, CSC

Volumn , Issue , 1998, Pages 100-109

  Ichimura, S ^a   Nonaka, H ^a   Kurokawa, A ^a   Nakamura, K ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ELECTRON BEAMS; INTERFACES (MATERIALS); OXIDATION; OZONE; SILICA; SILICON;

OZONE JET GENERATORS;

THIN FILMS;

EID: 0031644892     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)