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Volumn , Issue , 1998, Pages 56-60

Thermal and field dependencies of latent relaxation processes in irradiated MOS devices

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; GATES (TRANSISTOR); IRRADIATION; NUMERICAL METHODS; RELAXATION PROCESSES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; THRESHOLD VOLTAGE; VOLTAGE MEASUREMENT;

EID: 0031644266     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (16)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.