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Volumn , Issue , 1998, Pages 56-60
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Thermal and field dependencies of latent relaxation processes in irradiated MOS devices
a a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC CURRENT MEASUREMENT;
GATES (TRANSISTOR);
IRRADIATION;
NUMERICAL METHODS;
RELAXATION PROCESSES;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE TESTING;
THRESHOLD VOLTAGE;
VOLTAGE MEASUREMENT;
CURRENT VOLTAGE MEASUREMENT;
RADIATION TOLERANT PROCESS;
MOSFET DEVICES;
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EID: 0031644266
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (16)
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