New degradation scheme for direct-tunneling ultrathin gate dielectric

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 162-163

  Kimizuka, Naohiko ^a   Yamamoto, Toyoji ^a   Mogami, Tohru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; ELECTRON TUNNELING; GATES (TRANSISTOR); HOT CARRIERS; LEAKAGE CURRENTS; MOSFET DEVICES; ULTRATHIN FILMS;

DRAIN AVALANCHE HOT CARRIER (DAHC) INJECTION;

DIELECTRIC FILMS;

EID: 0031641776     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)