Extraction of sheet resistance from four-terminal sheet resistors replicated in monocrystalline films with non-planar geometries

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 1998, Pages 29-38

  Cresswell, M W ^a   Guillaume, N M P ^a   Allen, R A ^a   Guthrie, W F ^a   Ghoshtagore, R N ^a   Owen III, J C ^a   Osborne, Z ^a   Sullivan, N ^a   Linholm, L W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING; SILICON ON INSULATOR TECHNOLOGY;

ELECTRICAL CRITICAL DIMENSION (CD) METROLOGY; FOUR-TERMINAL SHEET RESISTORS; MONOCRYSTALLINE FILMS;

RESISTORS;

EID: 0031641089     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)