Correlation of stress with photo-degradation in hydrogenated amorphous silicon prepared by hot-wire CVD

Materials Research Society Symposium - Proceedings

Volumn 505, Issue , 1998, Pages 445-450

  Han, Daxing ^a   Gotoh, Tamihiro ^a   Nishio, Motoi ^a   Sakamoto, Tomonari ^a   Nonomura, Shuichi ^a   Nitta, Shoji ^a   Wang, Qi ^a   Iwaniczko, Eugene ^a  

^a UNIVERSITY OF NORTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; BENDING (DEFORMATION); CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; DEGRADATION; HYDROGENATION; PHOTOCHEMICAL REACTIONS; QUARTZ; THERMAL EFFECTS; THIN FILMS;

BENDING-BEAM METHOD; PHOTODEGRADATION;

AMORPHOUS SILICON;

EID: 0031640972     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)