In-situ UHV TEM investigations of the initial oxidation stage of copper thin films

Materials Research Society Symposium - Proceedings

Volumn 481, Issue , 1998, Pages 557-562

  Yang, J C ^a   Yeadon, M ^a   Kolasa, B ^a   Gibson, J M ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; COPPER OXIDES; DIFFUSION IN SOLIDS; FILM GROWTH; NUCLEATION; OXIDATION; PRESSURE EFFECTS; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ULTRA HIGH VACUUM (UHV) APPLICATIONS;

METALLIC FILMS;

EID: 0031640593     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)