Impedance matching for optimization of power transfer in a capacitively excited RF plasma reactor

EPJ Applied Physics

Volumn 3, Issue 1, 1998, Pages 91-95

  Mohamed Salem, M ^a   Loiseau, J F ^a   Held, B ^a  

^a UNIVERSITÉ DE PAU ET DES PAYS DE L'ADOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; ELECTRIC DISCHARGES; ELECTRIC POWER SUPPLIES TO APPARATUS; ENERGY TRANSFER; IMPEDANCE MATCHING (ELECTRIC); MATHEMATICAL MODELS; NETWORKS (CIRCUITS); OPTIMIZATION; PLASMA INTERACTIONS;

COIL INDUCTANCE; COLD PLASMA REACTORS;

PLASMA DEVICES;

EID: 0031637960     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998208     Document Type: Article

References (11)

1. S.E. Savas, D.E. Horne, R.W. Sadowski, Rev. Sci. Instrum. 57, 1248 (1986).
2. van den Hoek WGM, de Vries CAM, Heijman MGJ, J. Vac. Sci. Technol. B 5, 647-651 (1987).
3. R. John, Hollahan, T. Alexis, Bell Techniques and Applications of Plasma Chemistry (John Wiley & Sons, 1974).
4. Chris Bowick, RF Circuit Design (Howard W. Sams & Co., 1989).
5. G. Francis, Ionization phenomena in gases (Butterworth, London, 1960).
6. A.J. van Roosmalen, (I.C.P.I.G. 87) Le vide, les couches minces (supt.) 235, 99-105 (1987).
7. A.M. Pointu, Réactivité dans les plasmas (Les Éditions de Physique, Les Ulis, France, 1984) p. 1-57.
8. C.B. Zarowin, J. Electrochem. Soc. 130, 1144-1152 (1983).
9. V.A. Godyak, R.B. Piejak, J. Vac. Sci. Technol. A 8, 3833-3837 (1990).
10. C.M. Horwitz, J. Vac. Sci. Technol. A 1, 1795-1800 (1983).
11. C. Böhm, Thèse de doctorat, École Polytechnique, Palaiseau, France, 1992.