Highly robust ultra-thin gate dielectric for giga scale technology

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 218-219

  Khare, Mukesh ^a   Wang, X W ^a   Ma, T P ^a   Cui, G J ^a   Tamagawa, T ^a   Halpern, B L ^a   Schmitt, J J ^a  

^a YALE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; LEAKAGE CURRENTS; SILICON NITRIDE; ULTRATHIN FILMS;

JET VAPOR DEPOSITION (JVD); STRESS-INDUCED LEAKAGE CURRENTS;

DIELECTRIC FILMS;

EID: 0031636456     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)