Evaluation of Cu wiring in a production 64 Mb DRAM

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 24-25

  Cote, W ^a   Costrini, G ^a   Edelstein, D ^a   Osborn, C ^a   Poindexter, D ^a   Sardesai, V ^a   Bronner, G ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; COPPER; REACTIVE ION ETCHING;

RETENTION TIME;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0031636061     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)