Novel resist and post-etch residue removal process using ozonated chemistry

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 168-169

  De Gendt, S ^a   Snee, P ^a   Cornelissen, I ^a   Lux, M ^a   Vos, R ^a   Mertens, P W ^a   Knotter, D M ^a   He, M M ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

OZONE; PHOTORESISTS; SILICON WAFERS; SURFACE TREATMENT;

OZONATED CHEMISTRY; POST-ETCH RESIDUE REMOVAL PROCESS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031636056     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)