New STI process based on selective oxide deposition

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 208-209

  Elbel, Norbert ^a   Gabric, Zvonimir ^a   Langheinrich, Wolfram ^a   Neureither, Bernhard ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; NITRIDES; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH;

SELECTIVE OXIDE DEPOSITION (SELOX); SHALLOW TRENCH ISOLATION (STI);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031634341     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)