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Volumn 402-404, Issue , 1998, Pages 782-785

LEED intensity and surface core level shift analysis of the MBE-prepared GaAs(1̄1̄1̄)B(2 × 2) surface

Author keywords

GaAs(1 1 1 ); Gallium arsenide; Low energy electron diffraction (LEED); Molecular beam epitaxy; Photoemission; Surface core level shifts

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; ELECTRON ENERGY LEVELS; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; PHOTOEMISSION; SURFACE STRUCTURE;

EID: 0031633837     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)01060-1     Document Type: Article
Times cited : (21)

References (14)
  • 2
    • 25944457369 scopus 로고
    • G. Ertl, R. Gomer, D.L. Mills (Eds.), Springer, Berlin
    • W. Mönch, in: G. Ertl, R. Gomer, D.L. Mills (Eds.), Semiconductor Surfaces and Interfaces, Springer, Berlin, 1993, Vol. 26, p. 200.
    • (1993) Semiconductor Surfaces and Interfaces , vol.26 , pp. 200
    • Mönch, W.1
  • 6
    • 0347451562 scopus 로고    scopus 로고
    • to be published
    • M. Gierer et al., to be published.
    • Gierer, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.