Electromigration of submicron Damascene copper interconnects

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 156-157

  Ryu, Changsup ^a   Kwon, Kee Won ^a   Loke, Alvin L S ^a   Dubin, Valery M ^a   Kavari, Rahim A ^a   Ray, Gary W ^a   Wong, S Simon ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTROMIGRATION;

SUBMICRON DAMASCENE INTERCONNECTS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031632786     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)