Correcting separation errors related to contact resistance measurement

Microelectronics Journal

Volumn 29, Issue 1-2, 1998, Pages 21-30

  Li, Yao ^a   Harrison, H Barry ^a   Reeves, Geoffrey K ^b  

^a GRIFFITH UNIVERSITY   (Australia)

^b RMIT UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY ELEMENT METHOD; COMPUTER SIMULATION; ELECTRIC RESISTANCE; ERROR CORRECTION; MATHEMATICAL MODELS; OHMIC CONTACTS; SEMICONDUCTOR DEVICES; TRANSMISSION LINE THEORY;

PIVOT POINT; SEPARATION ERRORS; TRANSMISSION LINE MODEL; TRANSMISSION LINE MODEL TEST PATTERN;

ELECTRIC RESISTANCE MEASUREMENT;

EID: 0031632644     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2692(97)00028-1     Document Type: Article

References (8)

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7. Henry, H.G. Characterization of alloyed AuGe/Ni/ Au ohmic contacts to n-doped GaAs by measurement of transfer length and under the contact sheet resistance, IEEE Trans. Electron Devices, 36 (1989) 1390.
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