Silicon carbide on silicon - an ideal material combination for harsh environment sensor applications

IEEE International Symposium on Industrial Electronics

Volumn 2, Issue , 1998, Pages 732-736

  Kroetz, G ^a   Obermeier, E ^a   Wondrak, W ^a   Cavalloni, C ^a  

^a DAIMLER AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SUBSTRATES;

HARSH ENVIRONMENT SENSORS;

SILICON SENSORS;

EID: 0031632462     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)