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Volumn 525, Issue , 1998, Pages 135-140
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Laser ultrasonic instrumentation for accurate temperature measurement of silicon wafers in Rapid Thermal Processing systems
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL ORIENTATION;
LASER APPLICATIONS;
TEMPERATURE MEASUREMENT;
ULTRASONIC APPLICATIONS;
RAPID THERMAL PROCESSING (RTP);
SILICON WAFERS;
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EID: 0031629499
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-525-135 Document Type: Conference Paper |
Times cited : (7)
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References (9)
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