Atomic-scale analysis of laser MBE growth of oxide thin films by in situ RHEED and CAICISS

Materials Research Society Symposium - Proceedings

Volumn 502, Issue , 1998, Pages 227-236

  Yoshimoto, M ^a   Ohnishi, T ^a   Lee, G H ^a   Sasaki, K ^a   Maruta, H ^a   Koinuma, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; DEPOSITION; MOLECULAR BEAM EPITAXY; OXIDE SUPERCONDUCTORS; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING FILMS; SINGLE CRYSTALS; SPECTROSCOPY; STRONTIUM COMPOUNDS; SURFACE STRUCTURE;

ATOMIC SCALE ANALYSIS; COAXIAL IMPACT COLLISION ION SCATTERING SPECTROSCOPY; LASER MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; THIN FILM GROWTH;

FILM GROWTH;

EID: 0031628935     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)