Optimized poly-Si1-xGex-gate technology for dual gate CMOS application

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 190-191

  Lee, Wen Chin ^a   King, Tsu Jae ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON COMPOUNDS;

POLY-GATE-DEPLETION EFFECTS (PDE); SHORT-CHANNEL EFFECTS (SCE);

GATES (TRANSISTOR);

EID: 0031623818     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)