Hydrogen passivation and ozone oxidation of silicon surface

Materials Research Society Symposium - Proceedings

Volumn 513, Issue , 1998, Pages 37-42

  Kurokawa, Akira ^a   Nakamura, Ken ^a   Ichimura, Shingo ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DISSOCIATION; HYDROGEN; OXIDATION; OZONE; PASSIVATION; X RAY PHOTOELECTRON SPECTROSCOPY;

DIRECTIONAL MASS ANALYZERS;

SEMICONDUCTING SILICON;

EID: 0031623332     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-513-37     Document Type: Conference Paper

References (9)