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Journal of Adhesion Science and Technology

Volumn 12, Issue 10, 1998, Pages 1071-1080

Effect of interfacial mixing by N+ implantation on the adhesion and friction of Ti film on Si3N4

(6) Tian Jun, a Wang Qizu, b Chen Yufeng, c Yu Laigui, a Wang Lijuan, a Xue Qunji, a

a LANZHOU INSTITUTE OF CHEMICAL PHYSICS (China)

b LANZHOU UNIVERSITY (China)

c CHINA BUILDING MATERIALS ACADEMY (China)

Author keywords

Adhesion; Friction; Interfacial mixing; N+ implantation; Ti Si3N4

Indexed keywords

CRITICAL LOAD; IMPLANTED SPECIMENS; INTERFACIAL FAILURES; INTERFACIAL MIXING; NEAR SURFACE REGIONS; SCANNING ELECTRON MICROSCOPE; SCRATCH TEST; SUBSTRATE TEMPERATURE; TI FILM; XPS ANALYSIS;

AUGER ELECTRON SPECTROSCOPY; FRICTION; HYDROCARBONS; IONS; MIXING; SCANNING ELECTRON MICROSCOPY; SILICON; SINTERING; TITANIUM; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY; ADSORPTION; FAILURE ANALYSIS; INTERFACES (MATERIALS); ION IMPLANTATION; METALLIC FILMS; NITROGEN; SILICON NITRIDE; SUBSTRATES;

ADHESION;

INTERFACIAL MIXING; SAMPLE TILTING DIFFRACTION (STD);

EID: 0031623136 PISSN: 01694243 EISSN: 15685616 Source Type: Journal
DOI: 10.1163/156856198X00731 Document Type: Article

Times cited : (3)

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