Thermal desorption of hydrogen in Si and SiC nanoparticles produced by Plasma-Enhanced Chemical-Vapor Deposition

Materials Research Society Symposium - Proceedings

Volumn 513, Issue , 1998, Pages 427-432

  Costa, J ^a   Fort, J ^a   Sunol, J J ^a   Roura, P ^a   Viera, G ^a   Bertran, E ^a  

^a UNIVERSITY OF GIRONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CALORIMETRY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DESORPTION; HYDROGEN; MASS SPECTROMETRY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICON CARBIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

NANOSTRUCTURED MATERIALS;

EID: 0031621869     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-513-427     Document Type: Conference Paper

References (8)