Large eddy simulations in a rotating disk chemical vapor deposition reactor

American Society of Mechanical Engineers, Pressure Vessels and Piping Division (Publication) PVP

Volumn 377 I, Issue , 1998, Pages 211-216

  Van Santen, Helmar ^a   Kleijn, Chris R ^a   Van Den Akker, Harry E A ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; NATURAL CONVECTION; ROTATING DISKS; SILICON WAFERS; TURBULENCE;

LARGE EDDY SIMULATIONS;

SEMICONDUCTING FILMS;

EID: 0031621733     PISSN: 0277027X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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12. th International Conference and EUROCVD11, pages 214-221, Paris.