Particle measurements and transport in silane LPCVD

Institute of Environmental Sciences - Proceedings, Annual Technical Meeting

Volumn , Issue , 1998, Pages 270-277

  Nijhawan, Sandeep ^a   Rao, Nagaraja P ^a   Kittelson, David B ^a   McMurry, Peter H ^a   Campbell, Stephen A ^a   Brockmann, John E ^a   Geller, Anthony S ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTAMINATION; DIFFUSION; MASS SPECTROMETERS; MATHEMATICAL MODELS; NUCLEATION; POLYSILANES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; SILICON WAFERS;

PARTICLE BEAM MASS SPECTROMETER; POLYSILICON; PROCESS CHAMBER; THERMOPHORETIC PARTICLE TRANSPORT;

PARTICLE SIZE ANALYSIS;

EID: 0031621580     PISSN: 00739227     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)