On the measurement of residual stress in thin films

Materials Research Society Symposium - Proceedings

Volumn 505, Issue , 1998, Pages 519-525

  Zhao, Z B ^a   Hershberger, J ^a   Yalisove, S M ^a   Bilello, J C ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; LASER APPLICATIONS; MECHANICAL VARIABLES MEASUREMENT; RESIDUAL STRESSES; SEMICONDUCTING FILMS; SILICON WAFERS; STRESS ANALYSIS;

DOUBLE CRYSTAL DIFFRACTION TOPOGRAPHY (DCDT); LASER SCANNING TECHNIQUE (LST); PROFILOMETRY; STRESS MEASUREMENT;

THIN FILMS;

EID: 0031620973     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)