Fabrication of 12×12 matrix-addressed 780 nm oxide-confined VCSEL arrays

LEOS Summer Topical Meeting

Volumn , Issue , 1998, Pages 5-6

  Nakayama, Hideo ^a   Nakmaura, Takeshi ^a   Sakurai, Jun ^a   Ueki, Nobuaki ^a   Otoma, Hiromi ^a   Miyamoto, Yasuaki ^a   Yamamoto, Masateru ^a   Ishii, Ryoji ^a   Yoshikawa, Masahiro ^a   Fuse, Mario ^a  

^a FUJI XEROX CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; SEMICONDUCTING FILMS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

DISTRIBUTED BRAGG REFLECTORS (DBR); PLANARIZATION; VERTICAL CAVITY SURFACE EMITTING LASERS (VCSEL);

SEMICONDUCTOR LASERS;

EID: 0031619685     PISSN: 10994742     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)