메뉴 건너뛰기




Volumn , Issue , 1998, Pages 572-577

A Practical approach to static signal electromigration analysis

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; MICROSTRIP LINES; SIGNAL ANALYSIS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CURRENT DENSITY; INTEGRATED CIRCUIT LAYOUT; MICROPROCESSOR CHIPS; PRESSURE EFFECTS;

EID: 0031618666     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/277044.277195     Document Type: Conference Paper
Times cited : (23)

References (10)
  • 1
    • 0014630193 scopus 로고
    • Electromigration failure modes in aluminum metallization for semiconductor devices
    • Black, J. R. "Electromigration Failure Modes in Aluminum Metallization for Semiconductor Devices." Proceedings of IEEE, 57, p. 1587, 1969.
    • (1969) Proceedings of IEEE , vol.57 , pp. 1587
    • Black, J.R.1
  • 2
    • 0024865572 scopus 로고
    • Characterization of electromigration under bidirectional (BX) and pulsed unidirectional (PDC) currents
    • IEEE
    • Maiz, J. A. "Characterization of Electromigration under Bidirectional (BX) and Pulsed Unidirectional (PDC) Currents, " in Proceedings of 27'h Annual International Reliability Physics Symposium, IEEE, 1989, pp, 220-228.
    • (1989) Proceedings of 27'h Annual International Reliability Physics Symposium , pp. 220-228
    • Maiz, J.A.1
  • 3
    • 0027685138 scopus 로고
    • Short-time failure of metal interconnect caused by current pulses
    • Murguia, J. E., and Brenstien, J. B., "Short-Time Failure of Metal Interconnect Caused by Current Pulses, " IEEE Electron Device Letters, p. 481-483, 1993.
    • (1993) IEEE Electron Device Letters , pp. 481-483
    • Murguia, J.E.1    Brenstien, J.B.2
  • 4
    • 85053130251 scopus 로고
    • Approximate computation of signal characteristics of on-chip interconnect
    • Nagaraj NS, "Approximate computation of signal characteristics of on-chip interconnect." Proc. of ISCAS 1994.
    • (1994) Proc. of ISCAS
    • Nagaraj, N.S.1
  • 5
    • 0024906813 scopus 로고
    • Modeling of driving point characteristics of resistive interconnect for accurate delay estimation
    • O'Brien, P., "Modeling of Driving Point Characteristics of Resistive Interconnect for accurate delay estimation., " Proc. of ICCAD 1991, pp 512-515.
    • (1991) Proc. of ICCAD , pp. 512-515
    • O'Brien, P.1
  • 7
    • 0030182835 scopus 로고    scopus 로고
    • Reliability of metal interconnect after a high current pulse
    • Scarpulla, et al. "Reliability of Metal Interconnect After a High Current Pulse, " Electron Device Letters, 1996.
    • (1996) Electron Device Letters
    • Scarpulla1
  • 10
    • 0027187019 scopus 로고    scopus 로고
    • Ac electromigration characterization and modeling of multilayered interconnections
    • 1993
    • Ting, L, May, J.S., Hunter, W.R., and McPherson, J.W., "AC Electromigration Characterization and Modeling of Multilayered Interconnections, " Proceedings of IRPS, pp. 311-316 1993.
    • Proceedings of IRPS , pp. 311-316
    • Ting, L.1    May, J.S.2    Hunter, W.R.3    McPherson, J.W.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.