Formation of transparent SiO2 thin film at room temperature with excimer lamp irradiation

Materials Research Society Symposium - Proceedings

Volumn 495, Issue , 1998, Pages 401-406

  Okamoto, T ^a   Iizuka, H ^a   Ito, S ^a   Murahara, M ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; CURRENT DENSITY; DEPOSITION; FILM GROWTH; OXIDATION; PHOTOCHEMICAL REACTIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; THIN FILMS; TRANSPARENCY;

EXCIMER LAMPS; NITROGEN TRIFLUORIDE;

SEMICONDUCTING FILMS;

EID: 0031618532     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)