Laser chemical vapor deposition for microelectronics production

IEEE Aerospace Conference Proceedings

Volumn 1, Issue , 1998, Pages 377-382

  Terrill, R E ^a   Church, K H ^b   Moon, M ^b  

^a RAYTHEON COMPANY   (United States)

^b Volux Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH (CHEMICAL); CHEMICAL VAPOR DEPOSITION; GOLD COMPOUNDS; ION BEAMS; LASER CHEMISTRY; MICROELECTRONICS; ORGANOMETALLICS; PLATINUM; AEROSPACE APPLICATIONS; GOLD; LASER APPLICATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTRONIC PROCESSING; PHOTOLYSIS; PRINTED CIRCUIT BOARDS; PYROLYSIS;

ELECTRICAL CIRCUIT; ELECTRONIC APPLICATION; FOCUSED-ION-BEAM SYSTEM; LASER CHEMICAL VAPOR DEPOSITION; MICROELECTRONIC APPLICATIONS; PLATINUM DEPOSITIONS; PRODUCTION PROCESS; VARIOUS SUBSTRATES;

SUBSTRATES; PRINTED CIRCUIT MANUFACTURE;

DIMETHYL GOLD TRIFLUOROACETYLACETONATE (DMGT); LASER CHEMICAL VAPOR DEPOSITION (LCVD);

EID: 0031618341     PISSN: 1095323X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/AERO.1998.686934     Document Type: Conference Paper

References (9)

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9. R.E. Terrill, IEEE Aerospace Conference Proceedings, Vol. 3, pp 481-488