Reactive ion etching (RIE) system design and its characterisation

IETE Technical Review (Institution of Electronics and Telecommunication Engineers, India)

Volumn 15, Issue 1-2, 1998, Pages 49-54

  Paul, A K ^a   Sodhi, K ^a   Dimri, A K ^a   Banerjie, P C ^a   Bajpai, R P ^a  

^a CSIR CENTRAL SCIENTIFIC INSTRUMENTS ORGANISATION   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ION BOMBARDMENT; SEMICONDUCTING SILICON;

SULFUR HEXAFLUORIDE;

REACTIVE ION ETCHING;

EID: 0031598951     PISSN: 02564602     EISSN: 09745971     Source Type: Journal    
DOI: 10.1080/02564602.1998.11416728     Document Type: Article

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