Moire patterns in high resolution electron microscopy images of MoS2

Microscopy Research and Technique

Volumn 40, Issue 1, 1998, Pages 2-9

  Reyes Gasga, J ^a   Tehuacanero, S ^a   Yacamán, M José ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

High resolution electron microscopy; Image simulation; Moire patterns; MoS2 structure

Indexed keywords

LAYERED SEMICONDUCTORS; MOLYBDENUM COMPOUNDS; SULFUR COMPOUNDS;

ELECTRON MICROSCOPY IMAGES; IMAGES SIMULATIONS; MODEL-BASED OPC; MOIRE PATTERN; MOS2 STRUCTURE; SIMULATED IMAGES; SULPHUR LAYERS; SUPER CELL;

HIGH RESOLUTION ELECTRON MICROSCOPY;

MOLYBDENUM; SULFUR; DISULFIDE; MOLYBDENUM DISULFIDE;

ARTICLE; COMPUTER SIMULATION; ELECTRON MICROSCOPY; IMAGE PROCESSING; INTERFEROMETRY; MODEL; PRIORITY JOURNAL; SEMICONDUCTOR; STRUCTURE ANALYSIS; CHEMISTRY; METHODOLOGY; ROTATION;

COMPUTER SIMULATION; DISULFIDES; IMAGE PROCESSING, COMPUTER-ASSISTED; MICROSCOPY, ELECTRON; MOLYBDENUM; ROTATION;

EID: 0031594473     PISSN: 1059910X     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1097-0029(19980101)40:1<2::aid-jemt2>3.0.co;2-%23     Document Type: Article

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