The isoelectric state at the solution/air interface - Effect on the stability of foams and foam films from nonionic surfactants

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 129-130, Issue , 1997, Pages 257-266

  Khristov, Khristo ^a   Exerowa, Dotchi ^a   Yankov, Rosen ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Bulgaria)

Author keywords

Electrosurface properties; Foam; Foam films; Isoelectric state

Indexed keywords

ELECTRIC PROPERTIES; ETHERS; IONIC STRENGTH; ISOTHERMS; PH EFFECTS; PHASE INTERFACES; SURFACE ACTIVE AGENTS;

ISOELECTRIC STATE;

FOAMS;

ETHYLENE GLYCOL DERIVATIVE; NONIONIC SURFACTANT; PHENOL DERIVATIVE;

ARTICLE; CAPILLARY PRESSURE; FOAM; IONIC STRENGTH; ISOELECTRIC POINT; MOLECULAR STABILITY; PH; PRIORITY JOURNAL;

EID: 0031592179     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(97)00042-3     Document Type: Article

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