Direct writing of silicon gratings with highly coherent ultraviolet laser

Applied Physics Letters

Volumn 71, Issue 17, 1997, Pages 2442-2444

  Chao, Chung Yen ^a   Chen, Cheng Yen ^a   Liu, Chee Wee ^a   Chang, Yih ^b   Yang, C C ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL DEFENSE UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COOLING; LASER ABLATION; MELTING; PRISMS; Q SWITCHED LASERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; STRAIN; SURFACES;

AIR GAP; DIRECT WRITING; INTERFERENCE FRINGES; PERIODICAL CORRUGATION; SILICON GRATINGS; TEMPERATURE DEPENDENCE; THERMAL ANNEALING; THERMAL STRAIN; ULTRAVIOLET LASERS;

DIFFRACTION GRATINGS;

EID: 0031588236     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120447     Document Type: Article

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