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Applied Physics Letters

Volumn 70, Issue 23, 1997, Pages 3098-3100

Ion milling damage and regrowth of oxide substrates studied by ion channeling and atomic force microscopy

(5) Takeuchi, I a,b Sharma, R P a Choopun, S a Lobb, C J a Venkatesan, T a,c

a Bldg 142 (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c UNIVERSITY OF MARYLAND (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; CRYSTAL DEFECTS; ION EXCHANGE; JOSEPHSON JUNCTION DEVICES; MILLING (MACHINING); OXIDES; SEMICONDUCTOR GROWTH; SURFACE PHENOMENA;

ION CHANNELING; ION MILLING; LATTICE STEPS; METAL OXIDE SUBSTRATES; SURFACE CRYSTALLINITY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031560879 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.119103 Document Type: Article

Times cited : (4)

References (8)

1
- 21544432973
- K. Char, L. Antognazza, and T. H. Geballe, Appl. Phys. Lett. 63, 2420 (1993).
- (1993) Appl. Phys. Lett. , vol.63 , pp. 2420
- Char, K.¹ Antognazza, L.² Geballe, T.H.³

2
- 0027559046
- V. N. Glyantsev, M. Siegel, J. Schubert, W. Zander, U. Poppe, H. Soltner, A. I. Braginski, and C. Heiden, IEEE Trans. Appl. Supercond. 3, 2472 (1993).
- (1993) IEEE Trans. Appl. Supercond. , vol.3 , pp. 2472
- Glyantsev, V.N.¹ Siegel, M.² Schubert, J.³ Zander, W.⁴ Poppe, U.⁵ Soltner, H.⁶ Braginski, A.I.⁷ Heiden, C.⁸

3
- 0039241408
- P. A. Rosenthal, E. N. Grossman, R. H. Ono, and L. R. Vale, Appl. Phys. Lett. 63, 1984 (1993).
- (1993) Appl. Phys. Lett. , vol.63 , pp. 1984
- Rosenthal, P.A.¹ Grossman, E.N.² Ono, R.H.³ Vale, L.R.⁴

4
- 0030166140
- B. D. Hunt, M. G. Forrester, J. Talvacchio, J. D. McCambridge, and R. M. Young, Appl. Phys. Lett. 68, 3805 (1996); W. H. Mallison, S. J. Berkowitz, A. S. Hirahara, M. J. Neal, and K. Char, ibid. 68, 3808 (1996).
- (1996) Appl. Phys. Lett. , vol.68 , pp. 3805
- Hunt, B.D.¹ Forrester, M.G.² Talvacchio, J.³ McCambridge, J.D.⁴ Young, R.M.⁵

5
- 0030169504
- B. D. Hunt, M. G. Forrester, J. Talvacchio, J. D. McCambridge, and R. M. Young, Appl. Phys. Lett. 68, 3805 (1996); W. H. Mallison, S. J. Berkowitz, A. S. Hirahara, M. J. Neal, and K. Char, ibid. 68, 3808 (1996).
- (1996) Appl. Phys. Lett. , vol.68 , pp. 3808
- Mallison, W.H.¹ Berkowitz, S.J.² Hirahara, A.S.³ Neal, M.J.⁴ Char, K.⁵

6
- 5544323393
- L. Senapati, R. P. Sharma, T. Venkatesan, Z. Zhang, and W.-K. Chu, Appl. Phys. Lett. 68, 123 (1996).
- (1996) Appl. Phys. Lett. , vol.68 , pp. 123
- Senapati, L.¹ Sharma, R.P.² Venkatesan, T.³ Zhang, Z.⁴ Chu, W.-K.⁵

7
- 36449003594
- C. Kwon, Qi Li, X. X. Xi, S. Bhattacharya, C. Doughty, T. Venkatesan, H. Zhang, J. W. Lynn, J. L. Peng, Z. Y. Li, N. D. Spencer, and K. Feldman, Appl. Phys. Lett. 62, 1289 (1993).
- (1993) Appl. Phys. Lett. , vol.62 , pp. 1289
- Kwon, C.¹ Li, Q.² Xi, X.X.³ Bhattacharya, S.⁴ Doughty, C.⁵ Venkatesan, T.⁶ Zhang, H.⁷ Lynn, J.W.⁸ Peng, J.L.⁹ Li, Z.Y.¹⁰ Spencer, N.D.¹¹ Feldman, K.¹²

8
- 0001446119
- J. Fujita, T. Yoshitake, T. Satoh, S. Miura, H. Tsuge, and H. Igarashi, Appl. Phys. Lett. 59, 2445 (1991).
- (1991) Appl. Phys. Lett. , vol.59 , pp. 2445
- Fujita, J.¹ Yoshitake, T.² Satoh, T.³ Miura, S.⁴ Tsuge, H.⁵ Igarashi, H.⁶

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