Electron beam irradiation of Y1Ba2Cu3O7-x grain boundary Josephson junctions

Applied Physics Letters

Volumn 71, Issue 1, 1997, Pages 125-127

  Tafuri, F ^a,b   Shokhor, S ^c   Nadgorny, B ^c,d   Gurvitch, M ^c   Lombardi, F ^b   Di Chiara, A ^b  

^a SECOND UNIVERSITY OF NAPLES   (Italy)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^c STONY BROOK UNIVERSITY   (United States)

^d NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE; ELECTRON BEAMS; EPITAXIAL GROWTH; GRAIN BOUNDARIES; HIGH TEMPERATURE SUPERCONDUCTORS; INTERFACES (MATERIALS); IRRADIATION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION;

ELECTRON BEAM IRRADIATION; ISOTHERMAL ANNEALING; JUNCTION INTERFACE; YTTRIUM BARIUM CUPRATES;

JOSEPHSON JUNCTION DEVICES;

EID: 0031558198     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119448     Document Type: Article

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