Reduction of light-induced metastable changes in a-SiGe:H prepared by using helium dilution: Comparison of metastability of helium- and hydrogen-diluted a-SiGe:H alloys

Journal of Physics D: Applied Physics

Volumn 30, Issue 3, 1997, Pages 325-329

  Hazra, Sukti ^a   Middya, A R ^a,b   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

^b ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CHEMICAL VAPOR DEPOSITION; DEGRADATION; HELIUM; HYDROGEN; LIGHT; MICROSTRUCTURE; PLASMA APPLICATIONS; STABILITY;

DILUTION; LIGHT INDUCED DEGRADATION; LIGHT INDUCED RECOMBINATION; METASTABLE DEFECTS; OPTICAL GAP; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON GERMANIUM ALLOYS;

SILICON ALLOYS;

EID: 0031557085     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/3/003     Document Type: Article

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