Metallic single electron devices fabricated using a multilayer technique

Applied Physics Letters

Volumn 71, Issue 5, 1997, Pages 713-715

  Weimann, Th ^a   Wolf, H ^a   Scherer, H ^a   Niemeyer, J ^a   Krupenin, V A ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRODES; ETCHING; LITHOGRAPHY; MASKS; OXIDATION; TUNNEL JUNCTIONS;

SHADOW EVAPORATION; SINGLE ELECTRON TUNNELING TRANSISTOR;

TRANSISTORS;

EID: 0031552802     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119838     Document Type: Article

References (14)