Beam-bunching in an ECR ion source by the pulsed gating-potential method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 126, Issue 1-4, 1997, Pages 45-49

  Jeong, S C ^a   Oyaizu, M ^a   Kawakami, H ^a   Shirakabe, Y ^a   Nomura, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Beam bunching; Bunching effect; Enhancement factor of beam intensity; Pulsed gating potential method; Repetition rate

Indexed keywords

ELECTRODES; ELECTRON CYCLOTRON RESONANCE; ION SOURCES; IONIZATION; PLASMA CONFINEMENT;

BEAM BUNCHING EFFECT; BEAM INTENSITY; PULSED GATING POTENTIAL METHOD; REPETITION RATE;

ION BEAMS;

EID: 0031552342     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)01016-6     Document Type: Article

References (5)

1. S. Kubono et al., Proc. 4th Int. Conf. on Radioactive Nuclear Beams, June 4-7, 1996, Omiya, Japan.
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3. T. Nomura, Y. Shirakabe, N. Ikeda and T. Shinozuka, Nucl. Instr. and Meth. B 93 (1994) 492.
4. R. Geller, Ann. Rev. Nucl. Part. Sci. 40 (1990) 15, and references therein.
5. S.C. Jeong, M. Oyaizu, H. Kawakami, Y. Shirakabe, N. Ikeda and T. Nomura, Nucl. Instr. and Meth. B 114 (1996) 154.